PDF-To remove the areas of silicon dioxide unprotected by expose the silic

Author : lindy-dunigan | Published Date : 2016-03-21

ich is hydrophobic Observe the backside of the wafer to confirm this effect for a few seconds removed immerse the substrate tion Etch for an additional 30 7 Repeat

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To remove the areas of silicon dioxide unprotected by expose the silic: Transcript

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